Mask (Aligned Form)

From LSWiki

Contents 1 the form Mask 1.1 Form Type 1.2 Knowledge Requirement 1.3 Facility Formula 1.4 Facility Minimum 1.5 Facility Maximum 1.6 Energy Costs 1.7 Process to Actualize Form 1.8 Description

the form Mask

Form Type

symbol

Knowledge Requirement

have at least 140 points among 10% of Nihonese skill, 50% of elude pursuit skill and calligraphy skill and have at least 100 quest points

Facility Formula

15% of charisma plus 15% of intelligence plus 25% of leximancy skill plus 25% of calligraphy skill plus 10% of telesma skill plus 10% of elude pursuit skill plus 10% of Nihonese skill

Facility Minimum

204

Facility Maximum

350

Energy Costs

one hundred points of spiritual energy and twenty-five points of order energy

Process to Actualize Form

visualize the kanji for escape

Description

The ability to elude or escape capture is immense value, and not only practically, for confidence that one can achieve one's goals without being thwarted or imprisoned raises one's character and ambitions to that extent. This form was discovered by the Trueborn Alexandra, one of the oldest recorded Aligned, during a period of imprisonment. It offers the Aligned who can actualize it tremendous power and security: it manifests a mask that affords one an almost ghost-like form, making one intangible and invisible. The enchantment is primarily illusory, and it will break if one enters combat (but quickly reestablish itself once combat ends).

Like all Aligned armour manifestations, it will last either until banished, until one no longer has the order energy to maintain it, or until one disincarnates. To banish a mask, concentrate on returning the form within it to a potential state.

Development Information  : This form was created by Twilight; the source code was last updated Wed Nov 05 17:43:46 2008.